Knowledge

Diffusion barrier

Source đź“ť

201:
copper may contact and poison the very devices that they supply with energy and information; with barrier layers too thick, these wrapped stacks of two barrier metal films and an inner copper conductor can have a greater total resistance than the traditional aluminum interconnections would have, eliminating any benefit derived from the new metallization technology.
40:
diffusion barrier simultaneously, the bonding between layers needs to come from a chemical reaction of limited range at both boundaries. Materials providing good adhesion are not necessarily good diffusion barriers and vice versa. Consequently, there are cases where two or more separate layers must be used to provide a proper interface between substrates.
200:
in order to maintain a good electronic contact, while maintaining a low enough copper diffusivity to sufficiently chemically isolate these copper conductor films from underlying device silicon. The thickness of the barrier films is also quite important; with too thin a barrier layer, the inner
39:
between plate and substrate in order to work. The role of a diffusion barrier is to prevent or to retard the inter-diffusion of the two superposed metals. Therefore, to be effective, a good diffusion barrier requires inertness with respect to adjacent materials. To obtain good adhesion and a
102:
involves three diffusion barrier layers—copper, nickel, then chromium—to provide long term durability where there will be many large temperature changes. If chromium is plated directly onto the steel, then their different
94:
has excellent adhesion to many materials because of its reactivity. Its affinity for oxygen forms a thin stable oxide coat on the outer surface, creating a
185:
from soft metal interconnects, while maintaining an electrical connection between them. For instance, a layer of barrier metal must surround every
98:
which prevents further oxidation of the chromium, and of the underlying metal (if any), even in corrosive environments. Chromium plating on steel
24:
usually placed between two other metals. It is done to act as a barrier to protect either one of the metals from corrupting the other.
286: 63: 264: 104: 141:
are a few of the metal combinations used to form diffusion barriers for specific applications. Conductive
197: 95: 75: 254: 291: 99: 56:
metal combinations have been evaluated for their adhesion and diffusion barrier properties.
49: 67: 8: 186: 52:, and service life, are critical parameters to select diffusion barrier materials. Many 178: 88:
its virtue relies in its inertness, and ease of application; its problem is its cost.
260: 84:
also easily reacts with oxygen but its oxides have poor adhesion properties. As for
229: 225: 217: 162: 158: 146: 154: 48:
While the choice of diffusion barrier depends on the final function, anticipated
28: 280: 182: 36: 221: 150: 209: 190: 130: 53: 32: 213: 138: 134: 118: 114: 91: 59: 233: 142: 126: 122: 205: 110: 81: 71: 31:
layer to its substrate requires a physical interlocking, inter-
204:
Some materials that have been used as barrier metals include
21: 85: 259:, vol. 1 (4th ed.), Elsevier, p. 1355, 107:
will cause the chrome plating to peel off the steel.
196:
As the name implies, a barrier metal must have high
278: 20:is a thin layer (usually micrometres thick) of 189:in modern integrated circuits, to prevent 70:, adhesion and reliability because of its 279: 193:of copper into surrounding materials. 168: 252: 13: 14: 303: 236:, but "metals" in this context). 287:Semiconductor device fabrication 232:(the last four being conductive 246: 105:thermal expansion coefficients 1: 239: 43: 7: 10: 308: 145:can be also used, such as 78:properties of its oxide. 253:Cahn, Robert W. (1996), 74:reactivity and the self- 198:electrical conductivity 181:to chemically isolate 177:is a material used in 50:operating temperature 68:thermal conductivity 35:of the deposit or a 256:Physical metallurgy 187:copper interconnect 179:integrated circuits 169:Integrated circuits 100:for automotive use 266:978-0-444-89875-3 96:passivation layer 18:diffusion barrier 299: 271: 269: 250: 230:titanium nitride 226:tungsten nitride 218:tantalum nitride 163:titanium nitride 159:tungsten nitride 147:tantalum nitride 37:chemical bonding 307: 306: 302: 301: 300: 298: 297: 296: 277: 276: 275: 274: 267: 251: 247: 242: 171: 155:copper silicide 46: 12: 11: 5: 305: 295: 294: 289: 273: 272: 265: 244: 243: 241: 238: 183:semiconductors 170: 167: 62:provides good 45: 42: 27:Adhesion of a 9: 6: 4: 3: 2: 304: 293: 292:Metal plating 290: 288: 285: 284: 282: 268: 262: 258: 257: 249: 245: 237: 235: 231: 227: 223: 219: 215: 211: 207: 202: 199: 194: 192: 188: 184: 180: 176: 175:barrier metal 166: 164: 160: 156: 152: 148: 144: 140: 136: 132: 128: 124: 120: 116: 112: 108: 106: 101: 97: 93: 89: 87: 83: 79: 77: 73: 69: 65: 61: 57: 55: 51: 41: 38: 34: 30: 25: 23: 19: 255: 248: 222:indium oxide 203: 195: 174: 172: 151:indium oxide 109: 90: 80: 58: 47: 29:plated metal 26: 17: 15: 76:passivation 281:Categories 240:References 64:electrical 210:ruthenium 191:diffusion 131:zirconium 54:thin film 44:Selection 33:diffusion 234:ceramics 214:tantalum 143:ceramics 139:tungsten 135:vanadium 119:tantalum 115:Nichrome 92:Chromium 60:Aluminum 127:niobium 123:hafnium 263:  228:, and 206:cobalt 161:, and 137:, and 111:Nickel 82:Copper 72:oxygen 22:metal 261:ISBN 86:gold 66:and 283:: 224:, 220:, 216:, 212:, 208:, 173:A 165:. 157:, 153:, 149:, 133:, 129:, 125:, 121:, 117:, 113:, 16:A 270:.

Index

metal
plated metal
diffusion
chemical bonding
operating temperature
thin film
Aluminum
electrical
thermal conductivity
oxygen
passivation
Copper
gold
Chromium
passivation layer
for automotive use
thermal expansion coefficients
Nickel
Nichrome
tantalum
hafnium
niobium
zirconium
vanadium
tungsten
ceramics
tantalum nitride
indium oxide
copper silicide
tungsten nitride

Text is available under the Creative Commons Attribution-ShareAlike License. Additional terms may apply.

↑